|Jun. 8, 2018||SCIOCS’s HVPE(Hydride Vapor Phase Epitaxy) technology is covered by the Semiconductor Today magazine. New !
This is an article relating to GaN epitaxial wafers and GaN freestanding substrates by HVPE.
Expanding the application potential of hydride vapor phase epitaxy
|Mar. 17-20, 2018||SCIOCS presented at The Japan Society of Applied Physics The 65th Spring Meeting, 2018
Progress of Compound Semiconductor Device Technologies:
What Can Learn from History of GaAs Device Development
Link : https://meeting.jsap.or.jp/english/